Helium purifier

The purification substrate of Valco gas purifier is a non-volatile, heat activated adsorbent alloy, which is stable and contained in the welding components, making it safe and easy to use. There is a layer of oxide film on the surface of the adsorbent particles that needs to be activated by heating. The activation process must be completed in a vacuum or inert gas environment, which allows helium gas to diffuse freely between them and prevents the formation of an oxygen passivation layer. The helium and nitrogen purifiers have an automatic control feature design that maintains the adsorbent material at the optimal temperature, eliminating the possibility of heat loss.

Helium purifier

*Purified gas: He、Ne、Ar、Kr、Xe、Rn

*Zui High Operating Pressure: 1000 PSI

*Impurities can be removed: outlet impurities are less than 10pppb H₂O、H₂、 O₂、 N₂、 NO、NH₃、 CO、CO₂And CH₄This is based on a total inlet impurity of 10ppm, while other impurities removed include CF₄、 CCl₄、 SiH₄And light hydrocarbons.

*Impurities not removed: He、Ne、Ar、Kr、Xe、Rn

Nitrogen purifier

*Purified gas: only N₂

*Zui High Operating Pressure: 1000 PSI

*Impurities can be removed: outlet impurities are less than 10pppb H₂O、H₂、 O₂、 NO、NH₃、 CO、CO₂And CH₄This is based on a total inlet impurity of 10ppm, while other impurities removed include CF₄、 CCl₄、 SiH₄And light hydrocarbons.

*Impurities not removed: He、Ne、Ar、Kr、Xe、Rn、N₂